FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2063627215> ?p ?o ?g. }

• W2063627215 abstract "Ion beam lithography is one of the most promising future lithography technologies. A helium or hydrogen ion beam illuminates a stencil membrane mask and projects the image with 4X reduction to the wafer. The development of stencil masks is considered to be critical for the success of the new technology. Since 1997, within the European Ion Projection Lithography MEDEA (Microelectronic Devices for European Applications) project silicon stencil masks based on a wafer- flow process are developed. They are produced in a conventional wafer line. Six inch SOI (silicon-on-insulator) wafers are patterned with an e-beam wafer writing tool, then trenches are etched by plasma etching. Afterwards, the membrane is etched by wet etch using the SOI-oxide layer as an etch stop. The last step is to add a coating layer, which is sputtered onto the membrane. It protects the mask against ion irradiation damage. For metrology and inspection, methods used for conventional chromium masks as well as new techniques are investigated. Results from placement measurements on the Leica LMS IPRO tool will be presented. Finally, methods for CD measurement, defect inspection, repair and in-situ-cleaning in the stepper will be discussed, including experimental information of first tests." @default.
• W2063627215 created "2016-06-24" @default.
• W2063627215 creator A5004535462 @default.
• W2063627215 creator A5019641546 @default.
• W2063627215 creator A5029722112 @default.
• W2063627215 creator A5034348687 @default.
• W2063627215 creator A5055361305 @default.
• W2063627215 creator A5057705318 @default.
• W2063627215 creator A5070187630 @default.
• W2063627215 creator A5074071731 @default.
• W2063627215 creator A5075294865 @default.
• W2063627215 creator A5082614910 @default.
• W2063627215 creator A5091812033 @default.
• W2063627215 date "1998-12-18" @default.
• W2063627215 modified "2023-10-13" @default.
• W2063627215 title "Stencil mask technology for ion beam lithography" @default.
• W2063627215 cites W1992515710 @default.
• W2063627215 cites W2016414238 @default.
• W2063627215 cites W2065333620 @default.
• W2063627215 doi "https://doi.org/10.1117/12.332827" @default.
• W2063627215 hasPublicationYear "1998" @default.
• W2063627215 type Work @default.
• W2063627215 sameAs 2063627215 @default.
• W2063627215 citedByCount "3" @default.
• W2063627215 crossrefType "proceedings-article" @default.
• W2063627215 hasAuthorship W2063627215A5004535462 @default.
• W2063627215 hasAuthorship W2063627215A5019641546 @default.
• W2063627215 hasAuthorship W2063627215A5029722112 @default.
• W2063627215 hasAuthorship W2063627215A5034348687 @default.
• W2063627215 hasAuthorship W2063627215A5055361305 @default.
• W2063627215 hasAuthorship W2063627215A5057705318 @default.
• W2063627215 hasAuthorship W2063627215A5070187630 @default.
• W2063627215 hasAuthorship W2063627215A5074071731 @default.
• W2063627215 hasAuthorship W2063627215A5075294865 @default.
• W2063627215 hasAuthorship W2063627215A5082614910 @default.
• W2063627215 hasAuthorship W2063627215A5091812033 @default.
• W2063627215 hasConcept C100460472 @default.
• W2063627215 hasConcept C105487726 @default.
• W2063627215 hasConcept C120665830 @default.
• W2063627215 hasConcept C121332964 @default.
• W2063627215 hasConcept C145148216 @default.
• W2063627215 hasConcept C160671074 @default.
• W2063627215 hasConcept C161866238 @default.
• W2063627215 hasConcept C168834538 @default.
• W2063627215 hasConcept C171250308 @default.
• W2063627215 hasConcept C178790620 @default.
• W2063627215 hasConcept C185592680 @default.
• W2063627215 hasConcept C187937830 @default.
• W2063627215 hasConcept C192562407 @default.
• W2063627215 hasConcept C200274948 @default.
• W2063627215 hasConcept C204223013 @default.
• W2063627215 hasConcept C2779227376 @default.
• W2063627215 hasConcept C2781048479 @default.
• W2063627215 hasConcept C41008148 @default.
• W2063627215 hasConcept C459310 @default.
• W2063627215 hasConcept C49040817 @default.
• W2063627215 hasConcept C50774322 @default.
• W2063627215 hasConcept C53143962 @default.
• W2063627215 hasConcept C53524968 @default.
• W2063627215 hasConcept C544956773 @default.
• W2063627215 hasConcept C70520399 @default.
• W2063627215 hasConcept C76752949 @default.
• W2063627215 hasConceptScore W2063627215C100460472 @default.
• W2063627215 hasConceptScore W2063627215C105487726 @default.
• W2063627215 hasConceptScore W2063627215C120665830 @default.
• W2063627215 hasConceptScore W2063627215C121332964 @default.
• W2063627215 hasConceptScore W2063627215C145148216 @default.
• W2063627215 hasConceptScore W2063627215C160671074 @default.
• W2063627215 hasConceptScore W2063627215C161866238 @default.
• W2063627215 hasConceptScore W2063627215C168834538 @default.
• W2063627215 hasConceptScore W2063627215C171250308 @default.
• W2063627215 hasConceptScore W2063627215C178790620 @default.
• W2063627215 hasConceptScore W2063627215C185592680 @default.
• W2063627215 hasConceptScore W2063627215C187937830 @default.
• W2063627215 hasConceptScore W2063627215C192562407 @default.
• W2063627215 hasConceptScore W2063627215C200274948 @default.
• W2063627215 hasConceptScore W2063627215C204223013 @default.
• W2063627215 hasConceptScore W2063627215C2779227376 @default.
• W2063627215 hasConceptScore W2063627215C2781048479 @default.
• W2063627215 hasConceptScore W2063627215C41008148 @default.
• W2063627215 hasConceptScore W2063627215C459310 @default.
• W2063627215 hasConceptScore W2063627215C49040817 @default.
• W2063627215 hasConceptScore W2063627215C50774322 @default.
• W2063627215 hasConceptScore W2063627215C53143962 @default.
• W2063627215 hasConceptScore W2063627215C53524968 @default.
• W2063627215 hasConceptScore W2063627215C544956773 @default.
• W2063627215 hasConceptScore W2063627215C70520399 @default.
• W2063627215 hasConceptScore W2063627215C76752949 @default.
• W2063627215 hasLocation W20636272151 @default.
• W2063627215 hasOpenAccess W2063627215 @default.
• W2063627215 hasPrimaryLocation W20636272151 @default.
• W2063627215 hasRelatedWork W1547634443 @default.
• W2063627215 hasRelatedWork W1963931461 @default.
• W2063627215 hasRelatedWork W1978277210 @default.
• W2063627215 hasRelatedWork W2001539464 @default.
• W2063627215 hasRelatedWork W2037693707 @default.
• W2063627215 hasRelatedWork W2057034222 @default.
• W2063627215 hasRelatedWork W2069612855 @default.
• W2063627215 hasRelatedWork W2147463886 @default.
• W2063627215 hasRelatedWork W2262836177 @default.

• next