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- W2063630123 abstract "Flat, clean, essentially defect-free GaAs(001) surfaces were produced at 570 °C in an As4 overpressure using 1 keV Ar ion bombardment at an impingement angle φ of 15° from the surface plane and a dose of 2.3×1016 ions/cm2. Ion bombardment smoothened the surfaces leading to minimum roughness values of ≊0.3 nm and reflection high-energy electron diffraction (RHEED) patterns that showed streaks with a 2×4 reconstruction. GaAs films grown by molecular beam epitaxy on the sputter cleaned surfaces exhibited strong RHEED oscillations. Cross-sectional transmission electron microscope images showed that the epitaxial layers and substrates were defect-free except for 2–3-nm diam dislocation loops observed 10–20 nm below the substrate surface, separated by ≳100 nm along the interface." @default.
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- W2063630123 date "1995-06-05" @default.
- W2063630123 modified "2023-09-23" @default.
- W2063630123 title "Sputter cleaning and smoothening of GaAs(001) using glancing-angle ion bombardment" @default.
- W2063630123 doi "https://doi.org/10.1063/1.113620" @default.
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