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• W2063946694 abstract "A remote-coupled dual-directional coupler used in the single-directional mode for process harmonic end-point detection is described. Harmonic end-point detection of photoresist stripping and chamber cleaning of silicon dioxide is demonstrated in three different plasma tools for two plasma chemistries (pure O2 and 10% O2 in CF4, respectively). The responding harmonic number is found to be determined by the frequency response of the plasma tool, whereas the harmonic amplitude response is proportional to the volume of injected etched material, either from a wafer surface or chamber wall. The technique described uses a non-invasive remote-coupled probe which can be employed without re-engineering the plasma tool." @default.
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• W2063946694 date "2000-06-01" @default.
• W2063946694 modified "2023-09-26" @default.
• W2063946694 title "Remote-coupled sensing of plasma harmonics and process end-point detection" @default.
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• W2063946694 doi "https://doi.org/10.1016/s0042-207x(00)00229-3" @default.
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