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• W2063965765 abstract "Sputtering in general can be viewed as reactive sputtering due to the presence of virtual leaks in addition to the normally considered controlled gas leaks. A method is needed to reproducibly control critical film properties for practical manufacturing situations, especially in the case where the incorporation of precise amounts of a reactive gas like O2 or N2 are desired in a deposited film. These considerations have led to the development of a closed loop control system which uses glow discharge mass spectroscopy (GDMS) to detect plasma ions and thus act as a transduction element for feedback control to a servo leak valve. An LSI–ll microprocessor provides real time control of the desired process signals. GDMS control is more reproducible than merely controlling gas flow or monitoring gas partial pressure since the former does not account for virtual leaks, and the latter does not always reveal the reactive species present in the plasma. The general theory behind this approach is discussed, along with consideration of the system design and hardware. System control is achieved by using an algorithm based on ratios of ion signals in order to eliminate nonreproducibility caused by variation in the multiplier gain of the GDMS. Representative GDMS spectra and the techniques for determining optimum control signals are presented. In the Ta system, to control small amounts of O2, the Ta+/TaO+ ratio is used; and for control of N2, the Ta+/TaN+ ratio is satisfactory. For Ta films reactively sputtered in either O2 or N2, GDMS control ratios are well correlated with resultant film composition and electrical properties. Comparisons between GDMS control ratios of TaO cermet films and their respective Auger profiles, microprobe measurements, ρ and TCR are shown. Validity of this closed loop control concept is further demonstrated by the fact that three sputtering systems, including one in manufacturing, are now in operation and during a two-year period have provided similarly reproducible films to a ±5% level." @default.
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• W2063965765 date "1980-01-01" @default.
• W2063965765 modified "2023-09-25" @default.
• W2063965765 title "Closed loop control of thin film sputter deposition processes using glow discharge mass spectroscopy" @default.
• W2063965765 doi "https://doi.org/10.1116/1.570470" @default.
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