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• W2064080760 abstract "A collaborative experimental effort was initiated at a workshop at the 1988 Gaseous Electronics Conference (GEC) to start a program to understand the fundamental physics of processing plasmas, as well as give researchers a baseline experiment to develop plasma diagnostics to be used on manufacturing plasma systems. The design was based on the use of 4 in. diameter, aluminum electrodes in a parallel plate configuration at 13.56 MHz, run in a capacitively coupled discharge mode. Before conclusions about commercial plasma systems can be made from experimental results from the GEC cell, the GEC cell must be shown to behave similarly to that of a commercial system. The etching performance of a GEC cell was compared to a SEMI Group 1000 TP/CC reactive ion etcher (RIE). The GEC cell and the RIE gave similar etch rates and fluorine concentrations when the electrode plate spacing and power density were the same." @default.
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• W2064080760 date "1999-05-01" @default.
• W2064080760 modified "2023-09-27" @default.
• W2064080760 title "The Gaseous Electronic Conference (GEC) reference cell as a benchmark for understanding microelectronics processing plasmas" @default.
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• W2064080760 doi "https://doi.org/10.1063/1.873482" @default.
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