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• W2064161848 abstract "AbstractNanocrystalline diamond films with rms roughnesses in the order of 50 nm have been prepared by microwave plasma enhanced chemical vapour deposition. Ar-CH4 gas mixtures have been used in a coaxially bladed reactor, and Ar-H2-CH4 gas mixtures have been used in a reactor with a dual mode microwave applicator. These films have been examined by ultraviolet and visible Raman spectroscopy. They have been subjected to nanotribological investigation, with a view to their incorporation into microelectromechanical systems (MEMS). Comparisons with other diamond and hard carbon films are made, and the advantages of nanocrystalline diamond films are discussed." @default.
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• W2064161848 date "2003-05-01" @default.
• W2064161848 modified "2023-09-25" @default.
• W2064161848 title "Nanocrystalline diamond films for nanotechnology applications" @default.
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• W2064161848 doi "https://doi.org/10.1179/026708303225009328" @default.
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