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- W2064250525 abstract "Magnesium ions were implanted on silicon wafers using a vacuum arc plasma system with a straight 1 m long magnetic duct, 0.22 m in diameter. Good macroparticle filtering was obtained in samples positioned facing the plasma stream and complete filtering was achieved in samples with surfaces parallel to the plasma stream and magnetic field. Deposition is also minimized by placing sample surfaces parallel to the plasma stream. High resolution x-ray diffraction rocking curves of implanted samples show that the changes in lattice constant are due to compressive strain, and the distortion is larger for higher voltages. Without magnetic field the implantation was a few hundred angstroms deep, as expected, but with magnetic field the depth profile was surprisingly extended to over 0.1 μm, a fact for which we do not yet have a convincing explanation, but could be related to radiation enhanced segregation. The presence of a magnetic field increases substantially the retained implantation dose due to the increase in plasma density by two orders of magnitude." @default.
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- W2064250525 date "2002-07-26" @default.
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- W2064250525 title "Magnesium plasma immersion ion implantation in a large straight magnetic duct" @default.
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- W2064250525 doi "https://doi.org/10.1088/0963-0252/11/3/314" @default.
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