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- W2064274320 abstract "The transient reflectivity response of GaAs with a 2% excess As concentration (GaAs:As), prepared by As+ ion implantation, has been measured at photon energies near the band gap. Results are compared with similar measurements on implanted GaAs with a 0.01% excess As concentration, and unimplanted GaAs. For GaAs:As, the transient refractive index change Δn, is larger than, but of the opposite sign to that of unimplanted GaAs. The measured carrier lifetime of 1±0.1 ps is identical to that of low-temperature GaAs. The wavelength dependence of Δn indicates the presence of an induced absorption peak at photon energies near the band gap, which is attributed to band-gap renormalization." @default.
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- W2064274320 date "1996-06-03" @default.
- W2064274320 modified "2023-10-17" @default.
- W2064274320 title "Nonlinear optical response of As+-ion implanted GaAs studied using time resolved reflectivity" @default.
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- W2064274320 doi "https://doi.org/10.1063/1.116576" @default.
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