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- W2064294844 abstract "Dark field electron holography is a new TEM-based technique for measuring strain with nanometer scale resolution. Here we present the procedure to align a transmission electron microscope and obtain dark field holograms as well as the theoretical background necessary to reconstruct strain maps from holograms. A series of experimental parameters such as biprism voltage, sample thickness, exposure time, tilt angle and choice of diffracted beam are then investigated on a silicon-germanium layer epitaxially embedded in a silicon matrix in order to obtain optimal dark field holograms over a large field of view with good spatial resolution and strain sensitivity." @default.
- W2064294844 created "2016-06-24" @default.
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- W2064294844 date "2011-02-01" @default.
- W2064294844 modified "2023-10-14" @default.
- W2064294844 title "Dark field electron holography for strain measurement" @default.
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- W2064294844 doi "https://doi.org/10.1016/j.ultramic.2010.11.030" @default.
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