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• W2064587908 abstract "Platinum silicide thin films are ideal for electromechanical applications. Here, films are formed from thin bilayers of amorphous silicon and platinum for the first time. Simply changing the thickness ratio of the two materials in the bilayer allows the final film stoichiometry, and correspondingly, its mechanical and electrical properties, to be tuned in a wide range." @default.
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• W2064587908 date "2014-02-25" @default.
• W2064587908 modified "2023-10-16" @default.
• W2064587908 title "Tunable, Source-Controlled Formation of Platinum Silicides and Nanogaps from Thin Precursor Films" @default.
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• W2064587908 doi "https://doi.org/10.1002/admi.201300120" @default.
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