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- W2064745610 abstract "We investigate the stability of boron dopants near the interface between crystalline Si and amorphous SiO2 through first-principles density functional calculations. An interstitial B is found to be more stable in amorphous SiO2 than in Si, so that B dopants tend to segregate to the interface. When defects exist in amorphous SiO2, the stability of B is greatly enhanced, especially around Si floating bond defects, while it is not significantly affected near Si–Si dimers, which are formed by O-vacancy defects." @default.
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- W2064745610 date "2012-08-01" @default.
- W2064745610 modified "2023-10-15" @default.
- W2064745610 title "First-principles study of the segregation of boron dopants near the interface between crystalline Si and amorphous SiO2" @default.
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- W2064745610 doi "https://doi.org/10.1016/j.physb.2011.08.050" @default.
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