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- W2064796539 abstract "Absorber layer patterning process for low reflectivity tantalum boron nitride (LR-TaBN) absorber layer and chromium nitride (CrN) buffer layer were improved to satisfy high resolution pattern and high level critical dimension (CD) control. To make 100nm and smaller pattern size, under 300nm resist thickness was needed because of resist pattern collapse issue. We developed absorber layer dry etching process for 300nm thickness resist. Absorber layer patterning was done by a consequence of carbon fluoride gas process and chlorine gas process. We evaluated both gas processes and made clear each dry etching character. Sufficient resist selectivity, vertical side wall, good CD control and low buffer layer damage were obtained. Then, we evaluated how buffer layer dry etching affects EUV reflectivity. Finally, we evaluated EUV mask pattern defect inspection and defect repair. Sufficient contrast of mask pattern image and good repair result were obtained using DUV inspection tool and AFM nano-machining tool, respectively." @default.
- W2064796539 created "2016-06-24" @default.
- W2064796539 creator A5005110163 @default.
- W2064796539 creator A5016197670 @default.
- W2064796539 creator A5018351671 @default.
- W2064796539 creator A5028948944 @default.
- W2064796539 creator A5036739773 @default.
- W2064796539 creator A5059634801 @default.
- W2064796539 creator A5068454223 @default.
- W2064796539 creator A5072517591 @default.
- W2064796539 creator A5077380899 @default.
- W2064796539 creator A5080510255 @default.
- W2064796539 date "2006-10-06" @default.
- W2064796539 modified "2023-09-26" @default.
- W2064796539 title "Process development for EUV mask production" @default.
- W2064796539 doi "https://doi.org/10.1117/12.692519" @default.
- W2064796539 hasPublicationYear "2006" @default.
- W2064796539 type Work @default.
- W2064796539 sameAs 2064796539 @default.
- W2064796539 citedByCount "12" @default.
- W2064796539 countsByYear W20647965392013 @default.
- W2064796539 countsByYear W20647965392015 @default.
- W2064796539 crossrefType "proceedings-article" @default.
- W2064796539 hasAuthorship W2064796539A5005110163 @default.
- W2064796539 hasAuthorship W2064796539A5016197670 @default.
- W2064796539 hasAuthorship W2064796539A5018351671 @default.
- W2064796539 hasAuthorship W2064796539A5028948944 @default.
- W2064796539 hasAuthorship W2064796539A5036739773 @default.
- W2064796539 hasAuthorship W2064796539A5059634801 @default.
- W2064796539 hasAuthorship W2064796539A5068454223 @default.
- W2064796539 hasAuthorship W2064796539A5072517591 @default.
- W2064796539 hasAuthorship W2064796539A5077380899 @default.
- W2064796539 hasAuthorship W2064796539A5080510255 @default.
- W2064796539 hasConcept C100460472 @default.
- W2064796539 hasConcept C105487726 @default.
- W2064796539 hasConcept C120665830 @default.
- W2064796539 hasConcept C121332964 @default.
- W2064796539 hasConcept C1291036 @default.
- W2064796539 hasConcept C145018004 @default.
- W2064796539 hasConcept C146024833 @default.
- W2064796539 hasConcept C162996421 @default.
- W2064796539 hasConcept C171250308 @default.
- W2064796539 hasConcept C192562407 @default.
- W2064796539 hasConcept C204223013 @default.
- W2064796539 hasConcept C207789793 @default.
- W2064796539 hasConcept C2777441419 @default.
- W2064796539 hasConcept C2779227376 @default.
- W2064796539 hasConcept C41008148 @default.
- W2064796539 hasConcept C49040817 @default.
- W2064796539 hasConcept C520434653 @default.
- W2064796539 hasConcept C53524968 @default.
- W2064796539 hasConcept C76155785 @default.
- W2064796539 hasConceptScore W2064796539C100460472 @default.
- W2064796539 hasConceptScore W2064796539C105487726 @default.
- W2064796539 hasConceptScore W2064796539C120665830 @default.
- W2064796539 hasConceptScore W2064796539C121332964 @default.
- W2064796539 hasConceptScore W2064796539C1291036 @default.
- W2064796539 hasConceptScore W2064796539C145018004 @default.
- W2064796539 hasConceptScore W2064796539C146024833 @default.
- W2064796539 hasConceptScore W2064796539C162996421 @default.
- W2064796539 hasConceptScore W2064796539C171250308 @default.
- W2064796539 hasConceptScore W2064796539C192562407 @default.
- W2064796539 hasConceptScore W2064796539C204223013 @default.
- W2064796539 hasConceptScore W2064796539C207789793 @default.
- W2064796539 hasConceptScore W2064796539C2777441419 @default.
- W2064796539 hasConceptScore W2064796539C2779227376 @default.
- W2064796539 hasConceptScore W2064796539C41008148 @default.
- W2064796539 hasConceptScore W2064796539C49040817 @default.
- W2064796539 hasConceptScore W2064796539C520434653 @default.
- W2064796539 hasConceptScore W2064796539C53524968 @default.
- W2064796539 hasConceptScore W2064796539C76155785 @default.
- W2064796539 hasLocation W20647965391 @default.
- W2064796539 hasOpenAccess W2064796539 @default.
- W2064796539 hasPrimaryLocation W20647965391 @default.
- W2064796539 hasRelatedWork W1980636257 @default.
- W2064796539 hasRelatedWork W1991213903 @default.
- W2064796539 hasRelatedWork W1995361396 @default.
- W2064796539 hasRelatedWork W2072373671 @default.
- W2064796539 hasRelatedWork W2080447637 @default.
- W2064796539 hasRelatedWork W2600116639 @default.
- W2064796539 hasRelatedWork W2921363324 @default.
- W2064796539 hasRelatedWork W3013755930 @default.
- W2064796539 hasRelatedWork W3130873739 @default.
- W2064796539 hasRelatedWork W4283216871 @default.
- W2064796539 isParatext "false" @default.
- W2064796539 isRetracted "false" @default.
- W2064796539 magId "2064796539" @default.
- W2064796539 workType "article" @default.