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- W2064822625 abstract "This study investigated the chemical behavior of polymers bearing cycloaliphatic bornyl units along with the steric difference of the chiral (+)-bornyl methacrylate [(+)-BMA] and racemic (±)-BMA, expressed in the physical properties of the copolymers and the resist characteristics. To do this, a series of copolymers containing (+)-bornyl methacrylate [(+)-BMA] and (±)-BMA] units was synthesized. Comonomers of tert-butyl methacrylate (TBMA), methyl methacrylate (MMA), and maleic anhydride (MA) were used. The thermogravimetric curves, glass-transition temperature (Tg), and molecular weight (MW) of the copolymers were evaluated. Exposure characteristics of chemical-amplified positive photoresists comprising various copolymers were investigated. It was found that copolymers bearing (±)-BMA have higher Tg and better thermostability than those of copolymers containing (+)-BMA units. The copolymers with (±)-BMA units, however, revealed an inert photochemical behavior on the positive-tone photoresist. The patterning properties of the positive photoresist, composed of copolymers bearing (+)-BMA and (±)-BMA, and the photoacid generator (PAG) were also investigated. © 2001 John Wiley & Sons, Inc. J Appl Polym Sci 81: 3538–3544, 2001" @default.
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- W2064822625 date "2001-01-01" @default.
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- W2064822625 title "Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist" @default.
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- W2064822625 doi "https://doi.org/10.1002/app.1810" @default.
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