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- W2064879110 abstract "Abstract The influence of synchrotron radiation (SR) irradiation on Al chemical vapor deposition has been studied as a function of SR photon energy. A clear difference between inner shell electron excitation and valence electron excitation is observed. Suppression of Al growth on the Si surface is found to be induced effectively by the excitation of the inner shell electrons, while initiation of the growth on the SiO 2 surface is caused by the excitation of the valence electrons." @default.
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- W2064879110 title "Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition" @default.
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- W2064879110 doi "https://doi.org/10.1016/0169-4332(94)90410-3" @default.
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