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• W2065002904 abstract "Planview and cross-sectional transmission electron microscopy (XTEM), Auger electron spectroscopy and X-ray diffraction (XRD) have been applied to study the interfacial reactions of palladium thin films on Ge(111) and Ge(001) with particular emphasis on the epitaxial growth of Pd2Ge on Ge(111). Polycrystalline palladium and Pd2Ge grains as well as epitaxial Pd2Ge regions were observed in as-deposited (111) samples. Epitaxial Pd2Ge was found to cover about 60% of the germanium surface area in samples annealed at 160°C. The orientation relationships between epitaxial Pd2Ge and the germanium substrate were determined to be Pd2Ge[0001]|Ge[111] and Pd2Ge(10̄10)|Gē220). The Pd2Ge-Ge interface was found to be not very smooth. In samples annealed at 250–500°C, only polycrystalline PdGe was found. Randomly oriented polycrystalline palladium and Pd2Ge were found in as-deposited (001) samples. In samples annealed at 160°C, Pd2Ge and PdGe grains were found to coexist. Only polycrystalline PdGe grains were observed in samples annealed at 250–500°C. XTEM observations and XRD data revealed the presence of an epitaxial Pd2Ge layer, about 20–30 nm in thickness, locally between the palladium metal layer and germanium substrate in as-deposited (111) samples, irrespective of palladium metal layer thickness (30–220 nm) and deposition rate (0.1–0.7 nm s-1). The results for Pd2Ge and PdGe formation on germanium are compared with those for Pd2Si and PdSi formation on silicon." @default.
• W2065002904 created "2016-06-24" @default.
• W2065002904 creator A5024473142 @default.
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• W2065002904 date "1988-08-01" @default.
• W2065002904 modified "2023-09-27" @default.
• W2065002904 title "Interfacial reactions of palladium thin films on Ge(111) and Ge(001)" @default.
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• W2065002904 doi "https://doi.org/10.1016/0040-6090(88)90218-0" @default.
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