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- W2065039763 abstract "Employing deep reactive ion etching, we have realized narrow doped quantum wire arrays with lateral dimensions down to 60 nm. The wire systems are characterized by means of inelastic light scattering from confined plasmons. These modes display unique Raman selection rules which we explain by taking into account both the polarization and the parity of the local electric field distribution in the wires. Lateral electric widths and carrier densities of the wires are deduced from the comparison of the plasmon dispersion with classical models. The electric widths are found to equal the geometrical ones, and the densities are comparable to the initial one of the unpatterned sample. This constitutes clear evidence, in contradiction to previous reports based on magneto-transport and microwave transmission, of the absence of lateral depletion in our experimental conditions." @default.
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- W2065039763 date "1996-01-01" @default.
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- W2065039763 title "Raman scattering by plasmons in deep etched quantum wires" @default.
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- W2065039763 doi "https://doi.org/10.1016/0038-1101(95)00261-8" @default.
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