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• W2065312888 abstract "Chemical vapor deposition (CVD) was used to deposit silver films for superconducting wire applications. AgI, silver trifluoroacetate (Ag(TFA)), and perfluoro-1-methylpropenylsilver (Ag(PF)) produced the most promising silver films. CVD processing was optimized on these three precursors using thermodynamic calculations performed using a modified version of the SOLGASMIX-PV computer program. Ag(PF) produced the highest quality silver films at low temperatures and pressures. A fiber tow which contained a silver barrier layer and a YBa2Cu3Ox overlayer was found to be a superconductor at 72 K." @default.
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• W2065312888 date "1992-09-01" @default.
• W2065312888 modified "2023-10-16" @default.
• W2065312888 title "Chemical vapor deposition of silver films for superconducting wire applications" @default.
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• W2065312888 doi "https://doi.org/10.1016/0925-8388(92)90439-g" @default.
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