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- W2065367365 abstract "予備加工によりメサ構造を作製したSi(001) 基板上にSiをエピタキシャル成長させ, メサに沿って3次元島を形成させることで, ナノテクスチャの創成を試みている. メサの幅, 高さ, および成長条件を適切に制御することで, メサの中央および両端に1～3列の高さ数10nm, 間隔0.4～1mmの3次元島を整列させることができた." @default.
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- W2065367365 date "2005-01-01" @default.
- W2065367365 modified "2023-09-25" @default.
- W2065367365 title "A Study on Nano-texturing using Islands Generation in Epitaxial Growth" @default.
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- W2065367365 doi "https://doi.org/10.2493/jspe.71.744" @default.
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