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- W2065576794 abstract "The concept of intensity ratio alignment technique will be introduced by comparing it with the conventional null technique. For in situ/real time monitoring the plasma etching process, we will introduce a fixed incident angle alignment technique for a photoelastic modulation ellipsometer. In addition to ellipsometry, we will introduce a photoelastic modulation polarimetry to measure the twisted angle and phase retardation of a twisted nematic liquid." @default.
- W2065576794 created "2016-06-24" @default.
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- W2065576794 date "2003-02-01" @default.
- W2065576794 modified "2023-10-12" @default.
- W2065576794 title "The intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry" @default.
- W2065576794 doi "https://doi.org/10.1117/12.474392" @default.
- W2065576794 hasPublicationYear "2003" @default.
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