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- W2065578010 abstract "A XeCl excimer laser was used to irradiate a cyclohexane solution of poly(methylphenethylsilane) (PMPES) and in solution with CHCl3 as solvent, respectively. By measurement of the laser energy absorbed by the PMPES macromolecules and GPC analysis, both the average number of UV photons absorbed by a PMPES macromolecule under the XeCl excimer laser irradiation and that of the broken SiSi bonds were calculated. Furthermore, the apparent quantum yields for different solvent conditions were determined. As a result, the apparent quantum yield of the laser degradation of solution of PMPES in CHCl3 is two orders of magnitude higher than for its solution in cyclohexane. By XPS analysis, it was observed that the C/Si atomic number ratio for the product after irradiation increases, which indicates that solvents take part in the photoreaction and are combined into the degraded product, especially for CHCl3 as solvent. Following published work, we tentatively propose that the great difference between the apparent quantum yield of the laser degradation of the solution of PMPES in CHCl3 and that of the cyclohexane solution may result from the action of factors such as radical train transfer, fluorescence quenching, etc." @default.
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- W2065578010 date "1998-02-01" @default.
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- W2065578010 title "Studies on the laser degradation of polysilane solutions" @default.
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- W2065578010 doi "https://doi.org/10.1016/s0014-3057(97)00171-7" @default.
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