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- W2065639068 abstract "Abstract In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a double-stream gas puff target created in a vacuum chamber synchronously with the pumping laser pulse. The target is formed by pulsed injection of Kr, Xe or a KrXe gas mixture into a hollow stream of helium. The EUV radiation is focused using a grazing incidence gold-plated ellipsoidal collector. Spectrum of the reflected radiation consists of a narrow feature with intensity maximum at 10–11 nm wavelength and a long-wavelength spectral tail up to 70 nm. The exact spectral distribution depends on a gas applied for plasma creation. To avoid strong absorption of the EUV radiation in a residual gas present in the chamber during the source operation a two step differential pumping system was employed. The system allows for polymer processing under relatively high vacuum conditions (10−5 mbar) or in a reactive gas atmosphere. Polymer samples can be irradiated in a focal plane of the EUV collector or at some distance downstream the focal plane. This way fluence of the EUV beam at the polymer surface can be regulated." @default.
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- W2065639068 date "2011-08-01" @default.
- W2065639068 modified "2023-09-29" @default.
- W2065639068 title "Laser-plasma EUV source dedicated for surface processing of polymers" @default.
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- W2065639068 doi "https://doi.org/10.1016/j.nima.2011.05.033" @default.
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