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- W2065641519 abstract "Lithography simulation remains one of the primary aspects of most DfM flows, along with critical area analysis and chem-mech-polish (CMP) modeling. Often, the accuracy of the DfM flow is judged solely on the accuracy of the lithographic simulation. In this paper we attempt to refute that viewpoint and highlight the many sources of error in a DfM flow. We examine the factors that impact accuracy and attempt to quantify their effect. Differences between rigorous simulation, which includes full mask data preparation along with lithography simulation, and the use of compact models are explored. Required and achievable DfM accuracy over time and across multiple fabs is examined and the use of a closed-loop DfM flow is proposed." @default.
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- W2065641519 date "2007-03-16" @default.
- W2065641519 modified "2023-09-25" @default.
- W2065641519 title "Lithography simulation in DfM: achievable accuracy versus requirements" @default.
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- W2065641519 doi "https://doi.org/10.1117/12.712437" @default.
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