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- W2065646020 abstract "Considering the critical role of the storage capacitor on the reliability of ferroelectric random access memories (FeRAM), it is of particular interest to analyze the electrical and microstructural characteristics of the ferroelectric capacitor after the integration steps. In addition to standard electrical testing, the architecture of memory cell arrays in 0.35μm complementary metal-oxide-semiconductor (CMOS) technology was characterized using an original approach combining microfocused synchrotron x-ray fluorescence and diffraction. A 1.5 kbyte FeRAM memory block was scanned with a step size of 0.2μm while simultaneously acquiring fluorescence spectra and diffraction patterns in order to obtain, respectively, chemical and crystallographic mapping of the thin films constituting the memory cell. The excellent agreement observed between measured data and memory cell design explains the good electrical characteristics of the analyzed FeRAM chips." @default.
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- W2065646020 date "2006-03-01" @default.
- W2065646020 modified "2023-09-26" @default.
- W2065646020 title "Nondestructive microstructural diagnostic of integrated ferroelectric capacitor arrays: Correlation with electrical characteristics" @default.
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- W2065646020 doi "https://doi.org/10.1063/1.2176110" @default.
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