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- W2065647594 abstract "Band bending at both the SiO 2 side and the high- k side of the high- k /SiO 2 interface has been investigated using X-ray photoelectron spectroscopy (XPS). This band bending is not understandable on the basis of silicate formation or the fixed charges in high- k /SiO 2 /Si stacks if we do not consider dipole formation at the high- k /SiO 2 interface, which in turn confirms the dipole formation at the HfO 2 /SiO 2 interface and at the Y 2 O 3 /SiO 2 interface. By investigating band bending behavior, the opposite dipole directions have been evaluated between these two interfaces, and the relative difference in dipole magnitude has been demonstrated between the HfO 2 /SiO 2 interface and the Y 2 O 3 /SiO 2 interface. Although the band bending of SiO 2 is underestimated and that of high- k is overestimated, the estimation of relative dipole magnitude is not affected. The relative difference in dipole magnitude is estimated to be ∼0.6 eV between the HfO 2 /SiO 2 interface and the Y 2 O 3 /SiO 2 interface, which is consistent with relative flatband voltage shifts of ∼0.5 V." @default.
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- W2065647594 date "2011-03-01" @default.
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- W2065647594 title "Interfacial Dipole at High-k Dielectric/SiO<sub>2</sub> Interface: X-ray Photoelectron Spectroscopy Characteristics" @default.
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