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- W2065815517 abstract "The fracture resistance of a multilayer silicon nitride consisting of alternate dense and porous layers was investigated by a single-edge-V-notched beam (SEVNB) technique. Since silicon nitride whiskers were aligned parallel to the laminar direction in the porous layer, the crack deflected macroscopically along the whiskers, resulting in high apparent KI values, 15–25 MPa m1/2. The crack then propagated in mode I, and was arrested when KI was reduced to the fracture resistance without the crack deflection effects. These fracture resistance behaviors were well-explained in terms of the notch-insensitivity and the shielding effects of pull-out of the aligned whiskers." @default.
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- W2065815517 date "1999-09-01" @default.
- W2065815517 modified "2023-09-26" @default.
- W2065815517 title "Fracture toughness of multilayer silicon nitride with crack deflection" @default.
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- W2065815517 doi "https://doi.org/10.1016/s0167-577x(99)00090-7" @default.
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