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- W2065821455 abstract "The structural properties of the buried interface between an epitaxial layer of CoSi2 49 Å thick and a Si(111) substrate have been studied by the X-ray standing wave technique and double-crystal X-ray diffraction. The layer has been grown in ultrahigh vacuum. The analysis gives a quantitative measure of the perpendicular lattice mismatch between the overlayer and the substrate and of the distance between the first Co layer and the last Si diffracting plane. This distance is consistent with a fivefold or an eightfold coordination of the Co atoms at the interface." @default.
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- W2065821455 date "1989-04-01" @default.
- W2065821455 modified "2023-09-27" @default.
- W2065821455 title "Structural study of the CoSi2/Si(111) buried interface" @default.
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- W2065821455 doi "https://doi.org/10.1016/0039-6028(89)90830-3" @default.
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