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- W2065902503 abstract "Gratings were written in amorphous As–Se thin films using electron-beam lithography. Films were coated with different metals. Electrons caused the change in the refractive index, which could be analyzed through the diffraction pattern of the grating reading laser beam. The refractive index change was found to be dependent on the overcoated metal layer. Ultraviolet (UV) light exposure was applied on investigated films before and after the grating writing. In some cases the exposure given after the grating writing enhanced greatly the diffraction efficiency. Results suggest the use of these thin films as UV-light detectors." @default.
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- W2065902503 date "2001-09-24" @default.
- W2065902503 modified "2023-10-16" @default.
- W2065902503 title "Influence of ultraviolet-light exposure on electron-beam written gratings in amorphous As–Se thin films coated with different metals" @default.
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- W2065902503 doi "https://doi.org/10.1063/1.1405810" @default.
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