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- W2066184642 abstract "Fluoride antireflection multilayers were developed by ion beam sputtering method. Although fluoride multilayers fabricated by ion beam sputtering method are known to have good morphology and low scattering loss, their absorption loss appeared to be difficult to reduce. In this work, we succeeded in reducing their absorption loss by the optimization of the fabrication conditions. As a result, the extinction coefficients of each fluoride layer were of the order of 10-4 and the transmittance of our antireflection multilayer drastically increased up to 99.6% at the wavelength of 193.4 nm. To our knowledge, this is the highest transmittance ever achieved using ion beam sputtering method. We showed the strong potential of fluoride multilayers, fabricated by ion beam sputtering method, for industrial applications such as lithography systems, which used ArF excimer lasers." @default.
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- W2066184642 date "2004-01-23" @default.
- W2066184642 modified "2023-09-25" @default.
- W2066184642 title "Fluoride Antireflection Multilayers with High Transmittance for ArF Excimer Laser by Ion Beam Sputtering Method" @default.
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- W2066184642 doi "https://doi.org/10.1143/jjap.43.l258" @default.
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