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• W2066241270 startingPage "L1380" @default.
• W2066241270 abstract "The crystallization of plasma CVD amorphous Si films processed by isothermal annealing was studied by X-ray diffraction and Raman spectroscopy. The induction time for nucleation was defined as the period for which crystalline peaks do not appear. The temperature dependence of the induction time for nucleation was expressed by the activation-type relation with the negative activation energy. The results suggest a way to suppress the random nucleation in thermal annealing." @default.
• W2066241270 created "2016-06-24" @default.
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• W2066241270 date "1988-08-01" @default.
• W2066241270 modified "2023-09-30" @default.
• W2066241270 title "Induction Time for Nucleation in Amorphous Silicon Films Prepared by Plasma CVD" @default.
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• W2066241270 doi "https://doi.org/10.1143/jjap.27.l1380" @default.
• W2066241270 hasPublicationYear "1988" @default.
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