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- W2066295923 abstract "Abstract Using a 3 keV O 2 -beam in an in situ SIMS/RBS set-up, changes in sputter yield and ionization probability were measured in order to come to a better understanding of the behavior of the Si + signal during the build up of the altered layer. Based on the RBS-spectra the evolution of the sputter yield within the transient region can be determined. When combined with complementary results from a low energy ion scattering (LEIS) experiment [T. Janssens, C. Huyghebaert, W. Vandervorst, A. Gildenpfennig, H.H. Brongersma, in these proceedings], the ionization probability enhancement as a function of the oxygen concentration at the surface can be calculated." @default.
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- W2066295923 date "2003-01-01" @default.
- W2066295923 modified "2023-09-26" @default.
- W2066295923 title "Ionization probability changes of the Si+ ions during the transient for 3 keV O2+ bombardment of Si" @default.
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- W2066295923 doi "https://doi.org/10.1016/s0169-4332(02)00716-x" @default.
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