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- W2067029359 abstract "LiMn2O4 thin films were deposited on Si substrates at 575 °C and 100 mTorr of oxygen by pulsed laser deposition. The film was flat and dense with an average size of crystals of about 260 nm and showed mainly (1 1 1) out-of plane preferred texture. The initial specific capacity was about 111 mAh/g with a current density of 50 μAh/cm2. Ex situ XRD and Raman were used to investigate the structure changes of LiMn2O4 thin film after intercalation and deintercalation of lithium. XRD results revealed a relatively smaller lattice change with the removal of lithium in this thin film, compared to that of powder LiMn2O4 cathode." @default.
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- W2067029359 date "2008-01-01" @default.
- W2067029359 modified "2023-10-16" @default.
- W2067029359 title "Characterization of LiMn2O4 thin films grown on Si substrates by pulsed laser deposition" @default.
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- W2067029359 doi "https://doi.org/10.1016/j.jallcom.2006.01.130" @default.
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