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• W2067046972 abstract "Gradient porous silicon nitride (Si3N4) was fabricated by a novel vacuum foaming and freeze drying process. Aqueous Si3N4 slurries were foamed at vacuum pressure of 50–90 kPa, the green body was obtained by the freeze drying process, a gradient pore structure with porosities of 72–90% was achieved after pressureless sintering at 1680 °C. The porosity was increased with decreasing vacuum pressure. The pore structure consists of large pores (~100 μm) on top, medium pores (~45 μm) on the wall of the large pores, and small pores (~0.7 μm) in the matrix. Such gradient porous Si3N4 with macro- and micro-pores has potential application as high temperature filters." @default.
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• W2067046972 date "2015-02-01" @default.
• W2067046972 modified "2023-09-26" @default.
• W2067046972 title "Gradient porous silicon nitride prepared via vacuum foaming and freeze drying" @default.
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• W2067046972 doi "https://doi.org/10.1016/j.matlet.2014.11.067" @default.
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