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• W2067059216 abstract "The microstructural properties of an aluminum nitride (AlN) layer grown on a silicon (Si(110)) substrate were studied in detail using transmission electron microscope techniques to determine atomic structure and dislocation behavior. AlN islands elongated along the [112¯0]AlN//[1¯10]Si direction were observed at the initial growth stage on the Si(110) substrate. The threading dislocations with a Burgers vector vertical to the interface, most probably be = [0001] of the wurtzite structure, were frequently observed in the AlN thin film. Due to anisotropic biaxial strain distributions, two different atomic structure behaviors were observed along the two in-plane directions; a coherent interface was observed along the [112¯0]AlN//[1¯10]Si direction and a semicoherent interface, including periodic extra-half planes, was observed along the [1¯100]AlN//[001]Si direction. The extra-half planes were observed at approximately two monolayers above the interface, and not at the exact interface." @default.
• W2067059216 created "2016-06-24" @default.
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• W2067059216 date "2015-02-01" @default.
• W2067059216 modified "2023-10-16" @default.
• W2067059216 title "Microstructural characteristics of AlN thin layers grown on Si(110) substrates by molecular beam epitaxy: Transmission electron microscopy study" @default.
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• W2067059216 doi "https://doi.org/10.1016/j.tsf.2015.01.008" @default.
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