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• W2067135790 endingPage "325305" @default.
• W2067135790 startingPage "325305" @default.
• W2067135790 abstract "We report a method for manipulating feature sizes in Si-based grating structures by thermal oxidation, which allows the realization of fin width/period ratios not directly accessible by laser interference lithography. Taking advantage of the expansion in volume associated with the thermal oxidation of Si, grating structures with very high fin width/period ratios of the order of 0.96 were obtained, whereas subsequent chemical etching of the oxide yields grating structures with fin width/period ratios as small as ∼0.06." @default.
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• W2067135790 date "2008-07-02" @default.
• W2067135790 modified "2023-09-25" @default.
• W2067135790 title "Manipulating feature sizes in Si-based grating structures by thermal oxidation" @default.
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• W2067135790 doi "https://doi.org/10.1088/0957-4484/19/32/325305" @default.
• W2067135790 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/21828812" @default.
• W2067135790 hasPublicationYear "2008" @default.
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