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- W2067228775 abstract "The polarization anisotropy in the longitudinal surface barrier electroreflectance (ER) of heavily doped Si (110) single crystal is measured as a function of the bias for the 3.4 eV peak (E′0). The ER anisotropy under depletion and weak accumulation conditions is found to be characterized by the usual polarization ratio signature of S = 1.35. Both, in the flatband and in the strong accumulation regions practically no polarization dependence is observed. The data obtained indicate that the surface-related electrooptic effect contributes essentially to the isotropic behaviour of surface-barrier ER of Si due to surface quantization (flatband region) and to surface amorphism (strong accumulation). The unusual lineshape of the ER spectra taken in the flatband region is shown to be due to the mixing of the depletion- and accumulation-type spectra in the nondifferential ER measurement conditions. [Russian Text Ignored]." @default.
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- W2067228775 date "1978-06-01" @default.
- W2067228775 modified "2023-09-27" @default.
- W2067228775 title "Surface Phenomena in the Polarization-Dependent Electroreflectance Spectra of Si" @default.
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- W2067228775 doi "https://doi.org/10.1002/pssb.2220870226" @default.
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