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- W2067277299 abstract "The crystallographic orientation of aluminum and titanium planar sputtering targets is shown to influence via bottom coverage and collimation efficiency. A model is developed for predicting the transmission of sputtered atoms through a collimator, based on the measured crystallographic orientation distribution function (ODF). Experimental sputtering results are found to agree with the simulation results. Monte Carlo simulation of step coverage is performed using the angularly resolved sputtering yields derived from the ODF. Improvements in via bottom coverage, greater than 100% (relative), are observed for different crystallographic orientations. The combined effects of crystallographic orientation, target erosion profile, and gas pressure are discussed." @default.
- W2067277299 created "2016-06-24" @default.
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- W2067277299 date "1995-09-19" @default.
- W2067277299 modified "2023-10-06" @default.
- W2067277299 title "<title>Effect of sputtering target crystallographic orientation on step coverage and collimation efficiency</title>" @default.
- W2067277299 doi "https://doi.org/10.1117/12.221318" @default.
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