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- W2067371121 abstract "Surface phenomena which occur in the process of vanadium deuteride VDx formation during D2 interaction in situ with thin vanadium films deposited under UHV conditions were studied simultaneously measuring work function Φ and D2 pressure by means of short response time circuits. It was proved that on the basis of these measurements the distribution of deuterium between the surface and the bulk of vanadium deuteride can be determined. At 78 K the segregation of positively polarized, atomic deuterium adspecies on the outer surface occurred, decreasing Φ by as much as ∼1.8 eV. The concentration (D/V)surface∼2 was reached, while (D/V)bulk did not exceed 0.2." @default.
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- W2067371121 date "2002-09-01" @default.
- W2067371121 modified "2023-10-03" @default.
- W2067371121 title "Deuterium segregation on vanadium deuteride surfaces" @default.
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- W2067371121 doi "https://doi.org/10.1016/s0042-207x(02)00239-7" @default.
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