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- W2067502790 abstract "The influence of the non-uniformity of intensity distribution in a laser beam on the surface layer structure of As-implanted silicon crystals as well as a method for homogenizing a pulsed laser beam is described. Der Einfluß der Energiefluktuationen in einem Laserbündel auf die Struktur der Kristalloberfläche wird untersucht. Si-Einkristalle wurden mit As-Ionen implantiert und dann mit “pulsed laser” ausgeheilt. Hierzu wurde ein Rubinlaser verwendet. Ein Verfahren zur Eliminierung der Energiefluktuationen wurde mit positivem Ergebnis getestet." @default.
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- W2067502790 date "1982-01-01" @default.
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- W2067502790 title "Influence of non-uniformity of laser beam intensity on the surface layer structure of implanted silicon crystals" @default.
- W2067502790 doi "https://doi.org/10.1002/crat.2170170211" @default.
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