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• W2067549006 abstract "Titanium oxide films were deposited on glass substrates by d.c. reactive magnetron sputtering at different oxygen partial pressures (3.4 × 10−4 mbar to 3 × 10−3 mbar) and total pressures (2 × 10−3 mbar to 2 × 10−2 mbar). Two resolved peaks in thh Ols spectra of XPS were observed. These peaks were attributed to the OTi bonding and the OH bonding. The OH bonding component increased as the oxygen partial pressure and total pressure were increased. The near IR transmittance measurements showed that all films had an absorption near 2.8 microm, and the absorption increased as the total pressure and oxygen partial pressure were increased. These phenomena were related to the porosity of the film. The films prepared by d.c. reactive magnetron sputtering generally have a columnar structure with many pores. In air some of these pores are filled with water, and this results in the appearance of the OH bonding component and the absorption around 2.8 microm. The increase of the OH bonding component and the absorption around 2.8 microm indicates the increase film porosity." @default.
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• W2067549006 date "1994-02-01" @default.
• W2067549006 modified "2023-09-26" @default.
• W2067549006 title "Study of porosity of titanium oxide films by X-ray photoelectron spectroscopy and IR transmittance" @default.
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• W2067549006 doi "https://doi.org/10.1016/0040-6090(94)90117-1" @default.
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