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- W2067558332 abstract "Abstract We investigated growth of InGaAs with different In compositions on GaP (001) substrates by low-pressure organometallic vapor phase epitaxy (LP-OMVPE). From atomic force microscope (AFM), plan-view transmission electron microscope (TEM), cross-sectional TEM and high-resolution TEM observations, it was found that the growth depended clearly on the ratio of TMIn flow rate to the total flow rate of group-III sources ( x TMIn ). In the low x TMIn region, InGaAs grew as a layer. In the high x TMIn region, on the other hand, island formation took place. At x TMIn =0.5, InGaAs islands were formed by the Stranski–Krastanow (S–K) growth mode." @default.
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- W2067558332 date "2000-05-01" @default.
- W2067558332 modified "2023-09-26" @default.
- W2067558332 title "Growth mode transition of InGaAs in OMVPE growth on GaP (001)" @default.
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- W2067558332 doi "https://doi.org/10.1016/s0167-9317(99)00458-x" @default.
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