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- W2067611714 abstract "Using angle-resolved UPS at h̵ω = 21.2 eV we have measured the decay of the d-band emission of the Ni(110) substrate during the adsorption of Ar, Kr, Xe, H2, N2, O2, CO and H2O at temperatures of 300, 80 and 20 K. The decay of d-band intensity is interpreted as being due to scattering of the outgoing photoelectrons by the adsorbate. For several cases of known coverage for the monolayer, intergral cross-sections for electron scattering at 16 eV are deduced and compared with gas phase data. In addition, our method allows a fast determination of relative adsorbate coverages. Absolute coverages can be evaluated if the scattering cross-section and the sticking coefficient are known. Furthermore, the adsorption kinetics of the different adsorbate systems are discussed. For the adsorption of H2, N2, O2, CO, H2O and Xe precursor states are found at low temperatures." @default.
- W2067611714 created "2016-06-24" @default.
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- W2067611714 date "1983-10-01" @default.
- W2067611714 modified "2023-09-26" @default.
- W2067611714 title "Electron scattering and adsorption kinetics of Ar, Kr, Xe, H2, N2, O2, CO and H2O on Ni(110) determined by ARUPS" @default.
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- W2067611714 doi "https://doi.org/10.1016/0039-6028(83)90010-9" @default.
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