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- W2067777768 abstract "I n situ spectroscopic ellipsometry is used to reveal the structural changes that occur in the initial stages of the growth of microcrystalline silicon (μc-Si) deposited by glow discharge decomposition of a (SiH4,H2) mixture on silica substrates. In a first step, the real time measurements can be described by the following nucleation model: stable nuclei are created, with an average distance between them estimated to be ∼100 Å, followed by the growth of three-dimensional crystalline islands. In a second step an interfacial component composed of amorphous silicon and voids is produced as a consequence of the incomplete coalescence of the crystalline islands." @default.
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- W2067777768 date "1987-06-08" @default.
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- W2067777768 title "<i>I</i><i>n</i><i>s</i><i>i</i><i>t</i><i>u</i>spectroscopic ellipsometry investigation of the nucleation of microcrystalline silicon" @default.
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- W2067777768 doi "https://doi.org/10.1063/1.97757" @default.
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