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- W2067792421 abstract "Contact reactions between a Si substrate and thin films of TaW bilayers and codeposited alloys have been studied. The interdiffusion and silicide formation have been analysed by Auger electron spectroscopy and X-ray diffraction. In the bilayer structures the formation of TaSi2 and WSi2 is observed at 700–750°C and 800–850°C, respectively. For the Ta-rich alloy of Ta80W20, TaSi2 is formed at 700–750°C similarly to the bilayer case, but this is followed by the formation of Ta5 Si3 which disappears at higher temperatures. For the W-rich alloy of Ta20W80, silicide formation is delayed to higher temperatures due to alloying in the thin film." @default.
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- W2067792421 date "1983-04-01" @default.
- W2067792421 modified "2023-09-25" @default.
- W2067792421 title "Solid state reactions of TaW thin films and Si single crystals" @default.
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- W2067792421 doi "https://doi.org/10.1016/0042-207x(83)90060-x" @default.
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