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- W2067811849 abstract "Abstract Process parameters for pulsed laser deposition (PLD) (KrF laser, 248 nm on a silicon (Si)(100) substrate) of uniform cerium doped yttrium silicate (Y 2 SiO 5 :Ce) phosphor thin films were investigated for application in field emission displays (FEDs). An increase in the oxygen (O 2 ) ambient pressure to 1 Torr resulted in the growth of a nano phosphor thin layer. Surface morphology that was monitored with scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and atomic force microscopy (AFM) yielded a rougher surface on the nano particle thin film due to the spherically shaped nano particles. Cathodoluminescence (CL) spectroscopy that was done with 2 keV energy electrons (20 μA beam current) on the nano particle film, indicated a more intense CL intensity than the uniform thin film that was grown in vacuum (5 x 10 ‐6 Torr). The two main CL peaks on the nano particle film are situated at 438 and 468 nm (blue light) due to the 5d to 4f ( 2 F 5/2 and 2 F 7/2 ) transitions in Ce 3+ . (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2067811849 date "2008-01-23" @default.
- W2067811849 modified "2023-10-16" @default.
- W2067811849 title "Y2SiO5:Ce thin films grown by PLD" @default.
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- W2067811849 doi "https://doi.org/10.1002/pssc.200776835" @default.
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