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- W2068000319 abstract "The effects of atomic hydrogen irradiation on the surface cleaning of InP substrates have been investigated by reflection high-energy electron diffraction (RHEED) and Auger electron spectroscopy (AES). Carbon and oxygen-free clean surfaces of InP have been produced for a temperature range of as low as about 350°C for 30 min irradiation of atomic hydrogen. Under this condition, the RHEED patterns have revealed phosphorus-stabilized (2×4) reconstructed surfaces while indium-stabilized (4×2) reconstruction patterns have been observed upon cleaning by using the conventional arsenic irradiation at 530°C." @default.
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- W2068000319 date "1993-02-01" @default.
- W2068000319 modified "2023-09-27" @default.
- W2068000319 title "Low Temperature Surface Cleaning of InP by Irradiation of Atomic Hydrogen" @default.
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- W2068000319 doi "https://doi.org/10.1143/jjap.32.l287" @default.
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