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- W2068049803 abstract "The electrical resistivity and temperature coefficient of resistivity (TCR) of Cu and Nb thin films have been measured over a range of layer thicknesses between 5.6 nm and 1106 nm. The structure of the films has been characterized using transmission electron microscopy (TEM) and x-ray diffraction. The experimental results have been compared with the semi-classical theory of thin-film resistivity due to Dimmich. The grain boundary reflectivity, R, has been found to vary with grain size in the Nb films." @default.
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- W2068049803 date "1998-03-02" @default.
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- W2068049803 title "Electrical resistivity of Cu and Nb thin films" @default.
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- W2068049803 doi "https://doi.org/10.1088/0953-8984/10/8/007" @default.
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