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• W2068059239 abstract "Thermal stability and mechanical properties of zirconium tungsten nitride (Zr–W–N) thin films have been studied. Nano-structured Zr–W–N thin films have been deposited on Si (100) substrates by reactive magnetron sputtering at varying substrate temperatures Ts (100°–600 °C). For 100 °C ≤ Ts ≤ 600 °C, X-ray diffraction patterns of the films show a crystalline fcc phase with (111) and (200) preferred crystallographic orientations of grains. Maximum wear resistance (H/Er ~ 0.22) and maximum resistance to fatigue fracture (H3/Er2 ~ 1.0 GPa) have been obtained for the film deposited at Ts = 400 °C. Post annealing of the films deposited at 400 °C has been carried out in air from 100°–600 °C. Oxygen starts to be incorporated at 300 °C and films begin to peel off above 400 °C due to increase in oxygen incorporation. Hardness and elastic modulus of annealed films increase with increasing strain." @default.
• W2068059239 created "2016-06-24" @default.
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• W2068059239 date "2014-04-01" @default.
• W2068059239 modified "2023-09-24" @default.
• W2068059239 title "Study of thermal stability and mechanical properties of fcc phase Zr22W19N58 thin films deposited by reactive magnetron sputtering" @default.
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• W2068059239 doi "https://doi.org/10.1016/j.surfcoat.2014.02.032" @default.
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