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- W2068122094 abstract "ABSTRACT Metal ferroelectric insulator semiconductor (MFIS) structure using PZT and SiO2 as ferroelectric and insulator materials was fabricated. The high frequency and low frequency C-V curves under different applied voltage were measured. Based on physical and mathematics analyses of MFIS device the predictions of C-V characteristic under high and low frequency were given in detail. The distribution of charge in ferroelectric layer was also considered. The C-V Curve was divided into six different regions under low frequency. Comparing with experimental results, the detailed analyses were presented in this work. The influences of trapped charges on Low frequency C-V curves of MFIS were also considered. The similar analyses are processed in high frequency state. The predictions of frequency on C-V curves are confirmed by our experimental results. Furthermore, the influences of saturation of ferroelectric capacitor and applied voltage on C-V curves were also investigated in this paper." @default.
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- W2068122094 date "2005-09-01" @default.
- W2068122094 modified "2023-09-25" @default.
- W2068122094 title "ANALYSES OF C-V CHARACTERISTICS OF MFIS DEVICE UNDER HIGH AND LOW FREQUENCY" @default.
- W2068122094 cites W2133256815 @default.
- W2068122094 doi "https://doi.org/10.1080/10584580500413574" @default.
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