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- W2068148047 abstract "Single electron tunnel junctions have been formed in ultrathin silicon-on-insulator material by electron beam lithography and dry etching. Clear Coulomb blockade effects have been observed at 300 mK in the current-voltage characteristics as a function of the voltage applied to a control sidegate. The effects are not smeared out by thermal fluctuations until temperatures greater than 4 K are reached." @default.
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- W2068148047 title "Coulomb blockade in a silicon tunnel junction device" @default.
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