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- W2068191648 abstract "ZnO/MgO multilayer thin films were fabricated on Si (1 1 1) substrates by pulsed laser deposition (PLD) at 600 °C for 30 min. The oxygen pressure and laser repetition were kept at 20 Pa and 5 Hz, respectively. The PL measurements suggest that the UV peaks have a blue excursion of 4 nm from 379 to 375 nm, compared with ZnO films. The XRD analysis indicates that the position of ZnO (0 0 2) peaks from ZnO/MgO multilayer films have about 0.12° shift from 34.421°, that of ZnO films, to 34.545°. From TEM images, the thickness of the films is about 200 nm. By HRTEM and SAD images, the crystal phases and the polycrystalline state were observed in the multilayer films." @default.
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- W2068191648 date "2006-06-01" @default.
- W2068191648 modified "2023-10-10" @default.
- W2068191648 title "The fabrication of ZnO/MgO multilayer films on Si (111) by PLD" @default.
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- W2068191648 doi "https://doi.org/10.1016/j.vacuum.2005.12.010" @default.
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